a) Physical Vapor Deposition (PVD) model ETS, and b) Pulsed Laser Deposition model LTS. These systems are able to deposit with nanometer thick in PLD method, the electron gun, and resistance vapor and spin coating. What follow are the particulars of the devices:

1. PVD deposition system model ETS:

• volume of the steel chamber; 110 liters

• Final push; range of 10^-6 Mbar

• Evacuation system, mechanical and turbo molecular pumps

• Semi-automatic performance with a variety of support

• electric Lift chamber;

     Installed accessories on the instrument are:

• magnetic beam electron source of 3KW

• Resistance evaporation source 250A

• crystal thickness gauge

• Liquid nitrogen trap

• Electric rotary sample

• Sample heater (radiation type) with temperature controller

2. PLD deposition system model ETS:

• Content of steel chamber: 20Lit

• Final push; range of 10E-6 Mbar

• Drainage pump and turbo molecular

Installed accessories on the device are:

• Target substrate rotator set

• sample holder set

• Sample warmer (radiation type)