Deposition Laboratory is equipped with two instruments.
a) Physical Vapor Deposition (PVD) model ETS, and b) Pulsed Laser Deposition model LTS. These systems are able to deposit with nanometer thick in PLD method, the electron gun, and resistance vapor and spin coating. What follow are the particulars of the devices:
PVD deposition system model ETS:
volume of the steel chamber; 110 liters
Final push; range of 10-6 Mbar
Evacuation system, mechanical and turbo molecular pumps
Semi-automatic performance with a variety of support
electric Lift chamber;
Installed accessories on the instrument are:
magnetic beam electron source of 3KW
Resistance evaporation source 250A
crystal thickness gauge
Liquid nitrogen trap
Electric rotary sample
Sample heater (radiation type) with temperature controller